Vacuum Solutions for PVD / CVD Applications
Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD) processes rely on accurately controlled vacuum environments to achieve uniform coatings, strong adhesion, and repeatable film properties. From decorative and functional coatings to advanced optical and electronic films, vacuum systems play a critical role in deposition quality and process reliability. Ultrahivac delivers application-focused vacuum products and solutions designed to meet the demanding requirements of PVD and CVD coating systems across research, pilot, and industrial production environments.
Key Features & Benefits
Designed for stable and repeatable PVD / CVD deposition processes
Supports high and ultra-high vacuum coating environments
Compatible with sputtering, evaporation, and CVD systems
Enables uniform film thickness and coating consistency
Suitable for laboratory, pilot, and industrial coating facilities
Benefits
Reasons to Choose Ultrahivac for the PVD / CVD Segment
Industries
Vacuum Products & Solutions for the PVD / CVD Segment
Information
How Ultrahivac Supports the PVD / CVD Segment with Expertise
Frequently Asked Questions
Vacuum enables controlled deposition environments essential for coating quality and repeatability.
Requirements range from high vacuum to ultra-high vacuum depending on the process.
Yes, dry pumps are widely used to minimise contamination and improve coating consistency.
Yes, Ultrahivac supports both new installations and existing PVD / CVD systems.
Need reliable vacuum solutions for PVD / CVD coating applications?
Ultrahivac’s technical experts can help you identify and implement the right vacuum products and solutions for your coating processes.