Sputtering Targets – High-Purity Targets for Precision Thin-Film Deposition Processes
Sputtering Targets are high-purity materials used as the source in sputtering deposition processes to create thin films on substrates under vacuum conditions. These targets are manufactured with strict purity, density, and structural requirements to ensure consistent deposition rates, uniform film thickness, and high-quality coatings. Available in a wide range of metals, alloys, ceramics, and compound materials, sputtering targets are essential for advanced thin-film applications in research and industrial production. Ultrahivac supplies premium-quality sputtering targets suitable for PVD, magnetron sputtering, and advanced coating applications across industries in India.
Key Features & Benefits
High purity and density for consistent deposition
Uniform sputtering behaviour and film thickness
Available in metals, alloys, and ceramic materials
Compatible with magnetron and conventional sputtering systems
Suitable for research and industrial production use
Benefits
Reasons to Choose Our Sputtering Targets
Industries
Applications of Sputtering Targets
Information
How It Works and Technical Advantages
FAQs for Sputtering Targets
They are used as source materials in sputtering-based thin-film deposition.
Metals, alloys, ceramics, oxides, nitrides, and compound materials.
Yes, purity and microstructure directly impact coating performance.
Yes, they are designed for continuous research and industrial use.
Yes, size, shape, bonding, and material composition can be customised.